Application of Photosensitive Glass
نویسندگان
چکیده
منابع مشابه
Surface Free Energy Determination of APEX Photosensitive Glass
Surface free energy (SFE) plays an important role in microfluidic device operation. Photosensitive glasses such as APEX offer numerous advantages over traditional glasses for microfluidics, yet the SFE for APEX has not been previously reported. We calculate SFE with the Owens/Wendt geometric method by using contact angles measured with the Sessile drop technique. While the total SFE for APEX is...
متن کاملFabrication of Microstructure Arrays on Photosensitive Glass by Femtosecond Laser
1 Graduate Institute of Opto-Mechatronics, National Chung Cheng University, No. 168, University Rd., Min-Hsiung, Chia-Yi 621, Taiwan 2 ITRI South, Industrial Technology Research Institute, No. 8, Gongyan Rd., Liujia District, Tainan 734, Taiwan 3 Department of Mechanical Engineering, National Chung Cheng University, No. 168, University Rd., Min-Hsiung, Chia-Yi 621, Taiwan 4 Department of Mechan...
متن کاملMicrofabrication in Foturan Photosensitive Glass Using Focused Ion Beam
TM , using focused ion beam technology has been characterized. To date, most microfabrication in this material has used UV lithography and UV lasers, with minimum feature size of around 10µm determined by the grain structure, though there has been some recent work using high energy proton irradiation. Focused ion beam technology offers two potential advantages: features are etched directly with...
متن کاملMolecular relaxation in a photosensitive liquid-crystalline polymeric glass former
We have measured the relaxation to equilibrium in the supercooled nematic phase upon approach to Tg of a fragile liquid-crystalline photosensitive polymeric glass former. Perturbation is introduced in a non-conventional way by optical pumping (orientation) of the nematic polydomain phase. Relaxation back to equilibrium is followed both on the microscopic scale, by means of depolarized time-reso...
متن کاملApplication of Photosensitive Polyimide: Mask Saving Process for Buffer Coating
Issues in the LSI polyimide buffer coating process which uses photosensitive polyimide also as a mask of passivation film etching are reviewed. Change of lithography wave length from g-line to i-line causes the difficulty in the polyimide patterning. However, today's improved polymers, both ester type and ionic type, have enough ability to open 10 um windows. Dry etching condition must be adjus...
متن کاملذخیره در منابع من
با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید
ژورنال
عنوان ژورنال: The Journal of the Institute of Television Engineers of Japan
سال: 1963
ISSN: 1884-9644
DOI: 10.3169/itej1954.17.285